Elsayed M. Elsayed and Ahmed E. Saba:
Preparation of standard copper ferrite thin film from aqueous solution
Copper iron alloy, copper ferrite, anodic oxidation, nanocrystalline deposition, electrochemically produced thin films, current efficiency, current density
This study provides a method to prepare copper ferrite thin films meeting the standard specification from sulfate solution at room temperature. The suggested route involves electrodeposition of copper and iron oxide under galvanostatic conditions. The effect of current density, deposition time and ion concentration in the solute on the cathodic current efficiency of the deposition method and the film properties has been investigated. Results obtained reveal that a high-quality copper ferrite thin-film is prepared electrochemically from acidified sulfate solution (pH 2) at a current density of 0.01 A cm-2. The efficiency of the deposition method is directly related to the copper ion concentration, but becomes inversely proportional to the concentration of ferrous ions. A compact thin film of the product film is obtained after 300 s. The chemical formula of the ferrite thus produced reads Cu0.915 Fe2.085 O4, and it is built up from nano particles of 3.9 nm in diameter.
In addition, make sure to read these articles:
Influence of operational parameters on the performance of the Corex reduction shaft
Preparation of standard copper ferrite thin film from aqueous solution
|
top of page
read times
All external sites will open in a new browser.